INNOVATING THE FUTURE OF THIN FILMS
THIN FILM EQUIPMENT (TFE) A COMPANY BY PLASMA-THERM DELIVERS ADVANCED SPUTTERING, EVAPORATION, AND HIGH-PURITY MATERIAL SOLUTIONS FOR CUTTING-EDGE THIN FILM APPLICATIONS.
Plasma-Therm ANNOUNCES ACQUISITION OF THIN FILM EQUIPMENT SRL
TFE's PVD technologies highly complement Plasma-Therm's existing etch and deposition products and process solutions, enhancing its ability to meet a wider spectrum of semiconductor manufacturing and R&D market demands.
Thin Film Equipment (TFE) specializes in state-of-the-art sputtering, evaporation and PVD solutions for semiconductor R&D and production. Founded in 1996 and based in Binasco, Italy, TFE brings deep expertise in thin-film technologies and high-purity materials to meet the demands of MEMS, power devices, RFID, photonics and other advanced markets.
TECHNOLOGY
We advance our thin film technologies to deliver the highest levels of process control and film quality.
MARKETS & APPLICATIONS
Our equipment delivers precise thin film deposition performance for advanced packaging, sensors, and next-generation microelectronic devices.
PRODUCTS
By expanding our thin film solutions, we help customers achieve improved process stability, higher capacity, and consistent results.
WE’RE LOOKING FOR BRIGHT MINDS LIKE YOURS!
Join us in our quest to enhance the human experience.
